الفهرس 
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Abstract
In this work emphasis was given to improve ion beams obtained from the RF ion source. Thus, The objectives of this work are: a- Production of higher ion charge state which requires an intense plasma. This is achieved by the use of D.C magnetic field, the use of electron injection into the plasma, and tge work run at optimum discharge pressure. b- Increasing the value of the extracted current. c- Improving ion beam quality by its interaction with electron beam. The production of multiply charged ions requires an intense plasma. This leadsto the use of RF ion source with radial extraction, central constriction, and electron injection into plasma, together with magnetic field perpendicular toRF Field.