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Abstract
Find interested in depositing thin films of nickel oxide colloidal method with the use of technology for the preparation of dipping these films in order to achieve a high quality nickel oxide films as well as material improvement of their Kahrelaunap.
I have been using nickel acetate water and absolute ethyl alcohol as raw materials for the preparation of nickel oxide films on both glass slides and regular glass slides coated with a layer of tin oxide Balindiom restaurant. The rate of speed drag is 3 cm / min followed by heat treatment at different temperatures in the range of 673-733 Kelvin.
Were studied thermal analysis of powder prepared from the colloidal method results showed that the nickel oxide material crystallized at 660 Kelvin. They considered the infrared spectrum of the powder also has shown results on the existence of seismic Association between oxygen and nickel in all samples prepared. The results showed also the presence of small impurities from the Group of sulphate and in Alboudr record at a temperature of less of 673 Kelvin.
Been verified by a multi-crystal structure of the deposited films using X-ray diffraction. And using the Scherrer equation was calculated grain size for these films, was also calculate the density of the confusion and stress and lattice constants of the films prepared, in the crystal plane (002).
Were studied composition formative films prepared using a transmission electron microscope TEM, has been calculating the distance of the interface levels of knowledge Pal crystal d-spacing of the transmission electron microscope using Jatan.
Been studying the optical properties of films prepared, and set the parameters such as optical absorption coefficient and coefficient of Extension and the gap energy as well as refractive index, using measurements of transmittance and reflectance of the wavelengths in the range of 250 to 2500 nm. The results indicated the presence of two types of transitions are direct and non direct equivalence between the scope and delivery.
As for the refractive index has been studied has been appointed a high-frequency dielectric constant of the films prepared.
Were studied electrical conductivity of films prepared at temperatures range from 303 up to 423 Kelvin. The results showed that the relationship of electrical conductivity and temperature follow the Arrhenius relationship, as the activation energy was calculated for all films prepared at different temperatures.
They considered the behavior Alkahrelauna nickel oxide films prepared at different temperatures to determine the best performance and behavior during the session Kahrelauna coloring bleaching of the film in the presence of an aqueous solution of 1 mol of potassium hydroxide and the application of static voltage of 4.5 volts between the poles of the cell.
The results showed that heat treatment is the key to the impact of Alkahrelauna during the application of a complete cycle of the voltage. It is through the appointment of optical density at wavelength 500 nm The results showed that the behavior Alkahrelauna in his best performance in the case of films prepared with less heat treatment of 713 Kelvin.
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