الفهرس | يوجد فقط 14 صفحة متاحة للعرض العام |
المستخلص The thesis includes two main parts, the first one concerns with the theoretical background of plasma while the second part deals with the experimental work and the obtained results and their discussion. Valuable information about different types of plasma generation and characterization one collected and presented in an attractive way. Particularly Electron Cyclotron Resonance (ECR) plasma is explained in some details since it is used in deposition of silicon nitride film on the Si sample. The backbone of this thesis is the experimental work and the obtained results and their discussion. An electron cyclotron resonance (ECR) system is set up from its different components such as magnetron as a source of microwave radiation, water-cooled coils to produce high magnetic field, discharge chamber , vacuum system, and system to feed different gases with the pre-controlled flow rate in the discharge chamber. The needed magnetic field required to produce the desired electron cyclotron resonance (ECR) plasma is calculated. The double electric probe system is used to measure the electron temperature and ion density. Silicon nitride film was formed on the surface of a Si sample at the following plasma conditions: microwave frequency 2.45 GHz, microwave power (-200 W), and discharge pressure 3.8 to 4.4 mTorrs. |