الفهرس يوجد فقط 14 صفحة متاحة للعرض العام
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المستخلص
The thesis includes two main parts, the first one concerns with the
theoretical background of plasma while the second part deals with the
experimental work and the obtained results and their discussion.
Valuable information about different types of plasma generation and
characterization one collected and presented in an attractive way. Particularly
Electron Cyclotron Resonance (ECR) plasma is explained in some details
since it is used in deposition of silicon nitride film on the Si sample. The
backbone of this thesis is the experimental work and the obtained results and
their discussion.
An electron cyclotron resonance (ECR) system is set up from its
different components such as magnetron as a source of microwave radiation,
water-cooled coils to produce high magnetic field, discharge chamber ,
vacuum system, and system to feed different gases with the pre-controlled
flow rate in the discharge chamber.
The needed magnetic field required to produce the desired electron
cyclotron resonance (ECR) plasma is calculated. The double electric probe
system is used to measure the electron temperature and ion density.
Silicon nitride film was formed on the surface of a Si sample at the
following plasma conditions: microwave frequency 2.45 GHz, microwave
power (-200 W), and discharge pressure 3.8 to 4.4 mTorrs.