الفهرس | Only 14 pages are availabe for public view |
Abstract integrating the results obtaind for tungsten and nickel oxide films it can be concluded that: 1- the film growth parameters of both oxides are influeneed by the deposition conditions increasing the sputtering power and pressure of O2/Ar increases the deposition rate and the film thickness for tungsten oxide films the deposition rate and film thickness are strongly dependent pn the oxygen content of the sputtering atmospere during the deposition process in contrast the oxygen content has no strong effect on either the deposition rate or the film thickness for nickel oxide films 2- subjecting the nikel oxide films to 50 electrochemical cycles improves their electrochromic characteristics. 3- the response (time) in the bleached state is faster (shorter) than that the colourwd one for both oxide films |