الفهرس 
PART I : THEORETICAL BACKGROUND AND LITERATURE SURVEY
CHAPTER I : SOLAR selectIVE SURFACESOnly 14 pages are availabe for public view
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Abstract
integrating the results obtaind for tungsten and nickel
oxide films it can be concluded that:
1- the film growth parameters of both oxides are influeneed by
the deposition conditions increasing the sputtering power and
pressure of O2/Ar increases the deposition rate and the film thickness
for tungsten oxide films the deposition rate and film thickness are strongly dependent pn the
oxygen content of the sputtering atmospere during the
deposition process in contrast the oxygen content has no strong effect on either the
deposition rate or the film thickness for nickel oxide films
2- subjecting the nikel oxide films to 50 electrochemical cycles improves
their electrochromic characteristics.
3- the response (time) in the bleached state is faster (shorter) than that the
colourwd one for both oxide films