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Abstract In this work chemical etching characteristic of Makrofol-E SSNTDs has been studied, in details. A new suggested etching condition has been introduced and found to work successfully in background- track reduction and in registered energy- window improvement. An etchant concentration of 1.8 N (KOH +C2H5OH+ H2O) at 70 ˚C was used and alpha tracks of energies range from 1 to 5 MeV were recorded and surrounded with a noticeable (or, at least, distinguishable) low background level. Makrofol-E detectors were exposed to 22Ne, 40Ar, 65Zn and 129Xe ions with different energies and track parameters were then been measured. Diameters, densities and lengths of tracks were determined and various relationships were then extracted along with the evaluation of different detectors efficiencies. The dependence of the response function, V on the dose imparted to the detector was found and took the form V = 0.21 D (μGy) + 1.894 All results are discussed within the frame work of the theory of track formation in solid. |