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العنوان
Submitted in Partial Fulfillment of the Requirements for the Degree of Doctor of Philosophy in Engineering Physics/
الناشر
Ain Shams university.
المؤلف
El-Banna, Mohammed Mahmoud Ahmed Mohammed.
هيئة الاعداد
مشرف / Tarek Mohammad Abdolkader
مشرف / Wael Fikry Farouk
مشرف / Omar Abdel Halim Omar
باحث / Mohammed Mahmoud Ahmed Mohammed El-Banna
الموضوع
DG MOSFETs. Multi-gate MOSFET. Mode-space. Real-space.
تاريخ النشر
2011
عدد الصفحات
p.:163
اللغة
الإنجليزية
الدرجة
ماجستير
التخصص
الهندسة الكهربائية والالكترونية
تاريخ الإجازة
1/1/2011
مكان الإجازة
جامعة عين شمس - كلية الهندسة - Engineering Physics
الفهرس
Only 14 pages are availabe for public view

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from 163

Abstract

Scaling challenges and performance are directing the research into new device structures in the nanoscale regime. Double-Gate (DG), Multi-Gate
(MUG) and nanowire MOSFETs are promising candidates to satisfy the requirements of the International Technology Roadmap for Semiconductors
(ITRS). In such devices, quantization effects are dominant. Therefore, accurate
quantum-based device simulation tools are necessary to interpret experimental
results and predict device performance. Among the quantum transport model,
the Non-GF) is a promising one. The Real-
Space (RS) is the most accurate technique used in the NEGF but heavy in
computation. For saving computational burden, Mode-Space (MS) is preferred
although its accuracy is questionable.
FETMOSS simulator was developed in 2006 by a research group in
Faculty of Engineering at Ain shams University. It works under MATLAB
environment and based on the numerical solution of Poisson and Schrödinger
equations self-consistently. Simulation for quasi 2D DG MOSFETs with
Uncoupled Mode Space (UMS) was its goal. This technique is fast but valid for
silicon thickness less than 5nm. To overcome this problem, it is enhanced by
adding RS technique in 2009. In this thesis, we tried to increase the capabilities
of FETMOSS to carry out 2D and 3D simulation with more accurate and
efficient techniques for saving computational burden. For 2D simulation,
Coupled Mode Space (CMS) is added that has advantage of validity for any
silicon thickness unlike the UMS with the same accuracy. Then, new approach
is proposed, called Partial Coupled Mode Space (PCMS), which integrate
between the advantage of CMS in accuracy and UMS in the reduction in
simulation time. Finally, UMS is implemented and integrated into FETMOSS,for 3D simulation, for studying the effect of quantization in the width of the silicon in the device as well as the thickness