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العنوان
Transport Properties in the Deep
Submicron MOS Devices using 2D Simulation \
المؤلف
Abdolkader,Tarek Mohammad
هيئة الاعداد
مشرف / رفعت رزق باسيلى
مشرف / محمود فتحى محمود
مشرف / وائل فكرى فاروق
مناقش / سراج الدين السيد
تاريخ النشر
2000.
عدد الصفحات
174
اللغة
الإنجليزية
الدرجة
ماجستير
التخصص
الهندسة (متفرقات)
تاريخ الإجازة
1/1/2000
مكان الإجازة
جامعة عين شمس - كلية الهندسة - الفيزيقا و الرياضيات
الفهرس
Only 14 pages are availabe for public view

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Abstract

In the present work, a new highly user-oriented device simulator was developed for the study of
transport properties of planar MOSFETs by the solution of basic semiconductor equations in two
dimensions. This device simulator works under MATLAB environment. Perfect physical models for
Drift-Diffusion equations including band-structure parameters, carrier mobility, and
Generation-Recombination rates were implemented into the simulator.
The developed simulator works at different levels of sophistication (modes). The simplest mode
solves in one dimension, another one solves in two dimensions, third mode takes into account
generation mechanism, and the most sophisticated mode takes into account carrier heating. New
model for Gate­ Induced Drain Leakage (GIDL) phenomenon, ·observed in thin­ oxide MOSFETs, was
proposed and implemented into the simulator. Through the interactive easy to-use MATLAB graphical
user interface system, the user of the simulator can view the distribution of many local parameters
such as, doping concentration, electrfc potential, electric field, carrier mobility, and carrier
concentrations. Output drain current characteristics against both drain voltage and gate voltage
are available, as well. Sample outputs arc given ·accompanied with complete parametric study of
GIDL current.