الفهرس 
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Abstract
Metrology is the science of measurements. One of the main branches in the metrology is dimensional metrology that includes the measurement of dimensions in different levels of metrology includes measurements from nanoscale to large-scale ranges. Metrology has a continuous relation with the industry. As the miniaturization of dimensions goes down towards the nanoscale sizes, there is a necessity for metrology to improve its capability in this direction. Research work in this study gives attention to measurements in the range of nanometre up to several millimetres which are called micro and nanometrology. The measurement instruments used in this field of micro and nanometrology includes stylus instruments, optical instruments and scanning probe microscopes (SPMs). These instruments scan measured surfaces with a mechanical stylus probe (in stylus instruments) or light beams (in optical instruments) or very sharp probes based on physical phenomena (in scanning probe microscopes) to get 2D profiles of scanned surfaces. One of the most versatile tools in this field of micro and nanometrology is the atomic force microscope (AFM) that is related to the family of scanning probe microscopes (SPMs). The AFM depends on scanning the measured surface using a very sharp silicon cantilever tip. As the cantilever tip approaches the surface Van der Waal forces are generated at a few nanometres separation distance. These forces change by the change in the gap separating the AFM cantilever tip and the surface features at very close proximity. Recording the change in these interacting forces help in detecting very fine surface features (peaks and valleys).The motion of the AFM cantilever is monitored with external detection systems. The most common detection system in conventional AFMs is to use a laser beam reflected from the back surface of the cantilever into a position sensitive device (PSD). As the cantilever scans the surface and moves up and down over the peaks and valleys of the surface the reflected laser beam on PSD unit draws the profile and 3D shape of the scanned surface. Despite the high precision of this construction type of AFMs, it still has some major obstacles. This construction mostly limits the movement of the AFM cantilevers in order not to lose the laser beam alignment as the sample is moved under the cantilever tip with the xyz-Piezo stage (scanning sample). The space over the AFM head is not free and the integration with other measurement techniques becomes much harder. Conventional AFMs have a limited lateral range up to 100 μm. The throughput is limited and scanning time is increased. These technical problems affect greatly the capability of AFMs for precision measurements in miniaturization industry. The present study is an attempt to overcome some of the AFMs problems which limited their applications for large-scale nanometrology. The plan was to use a type of self-sensing AFM cantilever and integrate it into a nanomeasuring machine (NMM) to build up a different construction of AFMs called large-range atomic force microscope (LR-AFM) with selfsensing AFM cantilevers. The self-sensing cantilever has one or more integrated piezo resistors (single or up to four in a Wheatstone bridge) on its upper surface that can detect any deflection of the cantilever during operation. As the cantilever is deflected the resistance of the integrated piezo resistor is changed according to the amount of deflection consequently cantilever deflection can be determined. External detection systems as in conventional AFMs are no more required. The space above the self-sensing cantilevers is free. The integration into other measuring instruments is much easier and the cantilever can move freely. In the meantime, nanomeasuring machines (NMMs) have large scanning ranges up to several millimetres along the three axes x, y and z with sub-nanometre resolution. NMMs are based on the motion detection of high precise 3D stages provided with movable corner mirrors. The movements of NMMs are carried out using three fixed miniature interferometers based on Abbe offset-free measurements. The aim of this LR-AFM system is not only to measure horizontal surfaces but also to measure the inclined and sidewall surfaces. Actually, the construction and setup in present study use AFM cantilevers that are not only self-sensing but also self-thermal actuating integrated into a nanomeasuring machine (NMM-1) of measuring range of 25 mm × 25 mm × 5 mm in x-, y- and z-axes respectively. This large-range atomic force microscope (LR-AFM) is used in intermittent (tapping) measurement mode with thermal actuation while it can also be used in both contact and noncontact mode. The performance for the integrated system through oscillation frequency sweep, cantilever approach, surface scanning and factors affecting the scanning process was simulated. In the experimental work, the approach behaviour of the cantilever and performance of the developed LR-AFM system have been investigated. The approach behaviour was investigated at different oscillation amplitudes in dynamic mode in comparison to static mode (no oscillation). Then the self-sensing self-thermal actuating AFM cantilever assembly was integrated into the NMM-1 with appropriate mechanical and electrical setups to build up the LR-AFM system. The validation of the developed system has been proved. Operation parameters of LR-AFM system was studied and optimized. The developed LRAFM system was calibrated using high precision standards. After calibration, the developed system was used in imaging measurements and results compared to those obtained using a conventional optical AFM microscope. The developed system has proved its capability to measure precisely at nanoscale range with a resolution of 0.1 nm. The developed LR-AFM system has a large measuring range of several millimetres which enables the system to be used for large-range scanning and imaging measurements and for roughness measurements. It has been used for measuring of roughness standards having fine, middle and rough textures. An existing rotation system has also been integrated with the developed system and used for the measurement of sidewalls and inclined surfaces at various angles up to 30°. The associated measurement uncertainty of the developed LR-AFM system is evaluated.