الفهرس 
Self-similar methodOnly 14 pages are availabe for public view
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Abstract
The creation of surface nano-structures has become an important technological process. Irradiation of silicon oxide single crystal with slow highly charged ions can produce surface nano-hillocks. The formation mechanism of the created nano-hillocks is a topic of debate. One of the suggested formation mechanisms is a plasma expansion approach. The latter abstract is used to explain the creation of surface nano-hillocks in silicon oxide single crystal using a fully classical plasma model. For
this purpose, classical hydrodynamic ion fluid equation along with Maxwellian or non-Maxwellian electrons distributions are solved numerically to obtain the expansion profiles of the number density, fluid velocity, and electrostatic potential. The relevance of different plasma parameters such as temperature and density ratios, superthermal, and non-extensive parameters on the expansion
proles is highlighte.