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العنوان
Optical and Electrical Properties of Metal Oxide/Metal/Metal Oxide Multilayers Prepared by Pulsed Magnetron Sputtering /
المؤلف
Mohamed, Ahmed Thabet Ahmed.
هيئة الاعداد
باحث / احمد ثابت احمد
مشرف / فايز محمود الحصرى
f.hossary@science.sohag.edu.eg/
مشرف / محمد رائف اسماعيل
mohamed_ismail@science.sohag.edu.eg/
مشرف / الزهراء علي عبد المولي
z.ahmed@science.sohag.edu.eg/
الموضوع
plasma applications.
تاريخ النشر
2021.
عدد الصفحات
147 p. :
اللغة
الإنجليزية
الدرجة
ماجستير
التخصص
مواد العلوم (المتنوعة)
تاريخ الإجازة
29/9/2021
مكان الإجازة
جامعة سوهاج - كلية العلوم - الفيزياء
الفهرس
Only 14 pages are availabe for public view

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from 172

Abstract

The TiO2/Cu/TiO2 and CdO/Ag/CdO nanostructured multilayer films were arranged by DC pulsed magnetron sputtering. The optical and electrical characteristics of the multilayer films were presented and discussed. It was found that the Dc pulsed magnetron-sputtering parameters and the metallic interlayer characteristics (Cu(16-32 nm) and Ag(2-20 nm)) have massive effects on the optoelectronic properties of the multilayer films. The properties of the multilayer films were surveyed by different characterizing and testing techniques including; X-ray diffraction, scanning electron microscopy, energy dispersive analysis of X-rays (EDAX), EDAX mapping, thickness monitor, spectrophotometer, and conductivity measurement circuit. The results obtained from the presented study are summarized as follows: 1- The TiO2/Cu/TiO2 and CdO/Ag/CdO nanostructured multilayer films were successfully arranged on glass substrates with good adhesion using DC pulsed magnetron sputtering. 2- The metallic interlayer characteristics have massive effects on the optoelectronic properties of TiO2/Cu/TiO2 and CdO/Ag/CdO multilayer films.
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3- The transmittance of metal oxide single layer is higher than that for TiO2/Cu/TiO2 and CdO/Ag/CdO multilayers films, which is decreased as the metallic interlayer thickness increased. 4- The refractive index of TiO2/Cu/TiO2 and CdO/Ag/CdO multilayers films are increased with increasing the metallic interlayer thickness which is related to the variation of the film density with increasing the thickness of the metallic layer. 5- The energy band gap of TiO2/Cu/TiO2 and CdO/Ag/CdO multilayers films decreased with increasing the metallic interlayer thickness. The decrease in the optical band gap is attributed to some of metal atoms possibly diffuse to the metal oxide layers and contribute in band gap narrowing. 6- The electrical conductivity of the multilayer films increased as the metallic interlayer thickness increased which is related to the increase in the mobility and carrier concentrations. 7- The electrical conductivity could not be measured sensitively with high thickness of the multilayers. However, the optical conductivity can be engaged for monitoring the conductivity.
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8- The highest figure of merit value of 2.45 x10-3 was recorded for the CdO/Ag (16nm)/CdO multilayer film, which could participate as an electrode in optoelectronic applications. 9- CdO/Ag/CdO multilayer films for Ag interlayer thickness greater than 10 nm can be involved as SPPs nano wave-guide for telecommunications applications at excitation wavelengths of 775 and 1550 nm. Finally, it can be concluded that, - Controlling structural, metallic interlayer thickness and the total multilayer thickness can control the optoelectronic properties of the multilayer for uitable applications - Increasing the total multilayer thickness and the metallic interlayer thickness resulted in the appearance of interference fringes, decreasing the band gap energy and increasing the refractive index. - DC pulsed magnetron sputtering has an enormous effect on the physical properties of the coatings. This technique is considered a good method for preparing thin films which can be used in many industries and applications.