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العنوان
“Effect of Gamma Radiation on Some Physical Properties and Efficiency of Solar Cells Coated by Anti-Reflection Metal Oxides Using Pulsed Magnetron Sputtering Technique.” /
المؤلف
Abdel-Wahab, Amira Ali.
هيئة الاعداد
باحث / Amira Ali Abdel-Wahab
مشرف / Osama Mohamed Hemeda
مشرف / TalaatM.Meaz
مشرف / Sanaa Ahmed Fayek
الموضوع
Physics.
تاريخ النشر
2022.
عدد الصفحات
114 p. :
اللغة
الإنجليزية
الدرجة
الدكتوراه
التخصص
الفيزياء وعلم الفلك
تاريخ الإجازة
11/4/2023
مكان الإجازة
جامعة طنطا - كلية العلوم * - الفيزياء
الفهرس
Only 14 pages are availabe for public view

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from 136

Abstract

The Direct Current Pulsed Plasma Magnetron Sputtering Technique (DCPMST) is used for depositing three different anti-reflection coating films with constant thickness 40 nm of metal oxides, namely TiO2, ZrO2 and TiO2/ZrO2onto three different types of silicon wafers (100) n-type doped with phosphors, p-type doped with born, p-n junction wafers and glass substrate. Furthermore, the Anti-Reflective properties of silicon nitride deposited elsewhere using Plasma Enhanced Chemical Vapor Deposition (PECVD) were compared with those of metal oxide films.